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RIE System

NRE-4000 - RIE System

NRE-4000 - RIE System

NANO-MASTER’s NRE-4000 is a stand alone Reactive Ion Etching (RIE) system with showerhead gas distribution and water cooled RF platen. It has a stainless steel cabinet and a 13" cylindrical aluminum chamber that opens from the top for wafer loading. It can accept up to 8" (200 mm) wafers.
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Features

 

  • 13” aluminum hard anodized chamber
  • Showerhead gas distribution
  • Up to 200mm substrates
  • MFC’s with SS gas lines
  • DC Bias: up to -500V self bias, up to -1000V external bias
  • Automatic pressure control
  • 600W RF power supply with auto tuner
  • Water cooled or heated (400°C) platen
  • 250l/sec corrosive turbomolecular pump with suitable backing pump
  • Fully automated PC based, recipe driven
  • LabVIEW user interface
  • Fully safety interlocked
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